Accumulated tech

Part  1: Pure Tech

1.  Useful Linux tricks by step-by-step examples

          including shell/python/administration:  http://linux.byexamples.com/

2 100+ best free SW

which spread in all kinds of fields to easy our life, some of them should be very familiar to you, and some can give you some hints if you are seeking some candidates for work or project integration.

Check it at http://www.pcmag.com/article2/0,2817,2260070,00.asp

http://www.channelinsider.com/c/a/Spotlight/25-Free-Software-Programs-Worth-the-Download-691265/?kc=EWKNLEDP06252010A

4 Python Fundamentals video training

· Python Fundamentals (Video Training) 1 :http://www.eweek.com/c/a/Video/Python-Fundamentals-Video-Training-1/

· Python Fundamentals (Video Training) 2 :http://www.eweek.com/c/a/Video/Python-Fundamentals-Video-Training-2/

· Python Fundamentals (Video Training) 3 :http://www.eweek.com/c/a/Video/Python-Fundamentals-Video-Training-3/

· Python Fundamentals (Video Training) 4 :http://www.eweek.com/c/a/Video/Python-Fundamentals-Video-Training-4/

· Python Fundamentals (Video Training) 5 :http://www.eweek.com/c/a/Video/Python-Fundamentals-Video-Training-5/

· Python Fundamentals (Video Training) 6 :http://www.eweek.com/c/a/Video/Python-Fundamentals-Video-Training-6/

  9 Free Python Books:

http://linuxtoy.org/archives/9-free-python-books.html

4 Free Perl Books:

http://linuxtoy.org/archives/4-free-perl-books.html

5. a tool to check stack overflow

In Linux: Valgrind

For mac: : http://www.macwrite.com/critical-mass/memory-leaks-mac-os-x

*. Mac CrashReporter

   Can catch SIGBUS and SIGSEGV, and log is at ~/Library/Logs/CrashReporter/.

* Memory leak on windows

   DevPartner Studio Professional is a suite of tools allowing a developer to analyze .NET code for

    * Code Quality and Complexity

    * Memory Leak Detection

    * Memory Optimization

    * Performance Analysis (Timing)

    * Performance Expert (CPU, Disk and Network resource usage)

    * Code Coverage Analysis

    * Fault Simulation (both .NET and environmental)

    * Error Detection and Interop monitoring for C/C++ using BoundsChecker technology.

* Mac Daemons

On Mac OS X, the engine will be launched as root by launchd. As a daemon, it can only access a small set of frameworks, but we get enough of them to do what we need to do.
In specific answer to the question, the yeti engine will be able to mount volumes; shared or local.
See the following technical note for more information about daemons.
http://developer.apple.com/technotes/tn2005/tn2083.html#SECLIVINGDANGEROUSLY

* Mac port leak

mach ports are part of the mach IPC mechanism. They are similar to pipes. See the below link for more information.
http://developer.apple.com/documentation/Darwin/Conceptual/KernelProgramming/boundaries/chapter_14_section_4.html
I found this leak by watching the output from ‘top’. The ‘#PRTS’ column shows you how many ports a process has open. A port leak is equivalent to a memory leak since applications have only a limited number or ports available to use.
I tracked down the current leak to a scsi device access method called ObtainExclusiveAccess that we use to poll for device availability. Charles is trying to figure out now if we are using it wrong or if this is something we will have to work around.

*. Screen Sharing

      From: http://www.macworld.com/article/131094/2007/12/screensharepower.html

      Type the following into a terminal window to turn on screensharing via Bonjour:

      defaults write com.apple.ScreenSharing ShowBonjourBrowser_Debug 1

      If you don't know what screensharing is, read the article.

9 Wcsrtombs     UTF字符转换

10 inotify

            Inotify-tools Project website:

http://wiki.github.com/rvoicilas/inotify-tools/

            Inotify-tools help:

http://hi.baidu.com/all_i_have_wan/blog/item/039aa161ac867348eaf8f8e7.html

            Just now, I used the following command:

            Inotifywait –mr –e close_write /dir

11 Linux Kernel picture

      Pretty cool page with a lot of useful links:

http://www.makelinux.net/kernel_map.shtml

      i.e., an old but good article on the VMM:

http://www.redhat.com/magazine/001nov04/features/vm/

* Linux documentation

http://lxr.linux.no/

* CVS exclude tar

      tar -cvf backup.tar --newer 'Apr 12 13:15 2008' --exclude-from=exPattern --exclude-vcs *

* mstsc –v:servername /console

            log on to a Windows Server 2003-based server that is running Terminal Services remotely and interact with session 0 as if you were sitting at the physical console of the computer

            More information about mstsc command, please refer to http://support.microsoft.com/kb/278845

* function UWow64EnableWow64FsRedirection(bool).

        In 64-bit windows, there are two system foler.System32 is for native access, and it is for 64-bit application. The other is SysWoW64, which is for 32-bit application.

        If we call this function passing argument true, system will redirect the access to system32 folder to SysWoW64 for 32-bit application.

                This function is based on thread. That is to say enabling/disabling redirction only has an effect on the current thread. According to MSDN, enabling direction is the default. Only if one does want to access the 64bit  system32 folder, He/she should disabling the redirection. I cannot know why our code disables the redirection. I search this function in our solution, and find as many as 48 callings. Our code seems to disable the redirection in advance. Only we need redirection, we enable it.

* Setup NFS

/home/pan/shared 192.168.0.6/255.255.255.0(rw,insecure,no_root_squash,async,no_subtree_check)

* Component identity found in manifest does not match the identity of the component requested.

All DLLs can be found in VS2005's installed folder: Microsoft Visual Studio 8/VC/redist.

If it’s debug version, copy the dlls in the debug folder to your app folder.One example is:

/Microsoft Visual Studio 8/VC/redist/Debug_NonRedist/amd64/Microsoft.VC80.DebugCRT

* Mac boot setting

file /Library/Preferences/SystemConfiguration/com.apple.Boot.plist

* Windows Performance tools within Visual Studio 2005

http://msdn.microsoft.com/en-us/library/z9z62c29%28v=VS.80%29.aspx

翻译:and a material design model, for simulating the characteristics of the semiconductor equipment. Mitrovic and Strang [19] applied the first-principle simulation to virtual sensor measurements to facilitate the process performed by the semiconductor processing tool. However, semiconductor manufacturing consists of hundreds of processing phases, months of processing time and correlative process flows [20]. The corresponding behavior analysis of the tool failure degradation process is very limited. Thus, the results provide neither reliable and accurate physical or mathematical models nor confident experience feedback for mechanism-based modeling. This is the main limitation of the applications of model-based approaches. In the knowledge-based methods, competitive advantages for stabilizing maintenance processes and reducing unplanned costs are realized by holistic consideration of production processes [21]. Prescriptive maintenance is known as the highest maturity and complexity level of knowledge-based maintenance [22], and “how can we control the occurrence of a specific event” should be answered and useful advice for decision-making to be given to improve and optimize the upcoming maintenance processes [23]. Nemeth et al. [22] built on the concept of prescriptive maintenance and proposed a reference model called PriMa-X to support the implementation of a prescriptive maintenance strategy and the assessment of its maturity level, facilitating the integration of data driven methods for predicting future events and identify action fields to reach an enhanced target maturity state. Padovano et al. [24] proposed a framework to construct the missing link between prescriptive maintenance and production planning and control functions in a cyber–physical production environment. Shaheen and Németh [25], Silvestri et al. [26], and Zonta et al. [27] discussed the prescriptive maintenance methods for Industry 4.0 technologies. Obtaining domain knowledge and converting it to precise rules are usually difficult as they require strong background and experience. Besides, the new situations without being covered by the knowledge bases cannot be handled. Data-driven methods are effective when acquiring practical data is more convenient than establishing physical or analytical models [28]. With the development of sensor techniques and wide applications of advanced process control technologies [29], the numerous manufacturing data provide wide opportunities for applying the data-driven prognostics methods to deal with the failure time prediction in the semiconductor manufacturing. Based on the monitoring data, the system degradation tendency can be easily understood and predicted. Generally, data-driven methods applied to the prognostics in the industry are adapted from the ones used in machine learning [29], [30]: neural networks [10], [31], k-nearest neighbor [32], [33], statistical methods [11], [34], decision trees [35], [36], clustering analysis [37], [38], and so on. Regarding the prognostics in semiconductor manufacturing, Bouaziz et al. [40] addressed a predictive approach based on the Bayesian network to analyze the device health factor. It allows early scheduling for preventive maintenance and avoids unscheduled tool downtime. Jia et al. [41] developed an adaptive method on the basis of the polynomial neural network to infer the material removal rate in the chemical-mechanical planarization process of the semiconductor fabrication. Yang and Lee [42] applied the Bayesian belief network to analyze the causal relationship of the process variables and estimate their effects on wafer quality to achieve high-classification rates for wafer quality and identify the problematic sensors when any bad wafer is detected. In reality, the quantity and quality of the data collected from the processes are problematic when it comes to developing and maintaining effective data-driven prognostics models [43]. As the failure can be slowly accumulated, the relevant data for evaluating the failure behavior would be scarce. In addition, most data-driven prognostics methods in semiconductor manufacturing focus on the deterministic estimation without giving the confidence level of the inference of the tool failure prognostics, which implies how much effect on the accuracy of the prognostic models built upon the acquired data is unknown. Using the poorly monitoring data would result in an improper estimation of the cleaning time. For more accurate prognostics, it is necessary to have a good and reliable prognostic model. As the tool failure mechanisms and uncertainty in semiconductor manufacturing are complex and unavailable, this article proposes a data-driven prognostic method to study the failure behavior and predict the tendency on the basis of the obtained production data in the fabrication process. One of the achievements is implementing the prognostics for determining the explicit cleaning time and reducing the dependence on the mechanism analysis. A novel failure factor extraction and prognostic model is developed based on autoassociative regression (AR)-Gaussian process (GP), which is the integration of the AR [44] and the GP [45]. It can be used to analyze and extract the failure factors by the comparisons between the actual data and the fault-free data. Furthermore, with the analysis of the residual tendency, the abnormalities can be detected to be used as the variables of the prognostic model. To infer the future failure behaviors in the fabrication process of semiconductor manufacturing, the data-driven prognostic model is constructed on the basis of GP to present the degradation evolution in a probability distribution and evaluate the uncertainty. Thanks to the confident interval of each estimated value, the accuracy of the prediction influenced by the collected data quality can be presented. It cannot be done by the deterministic estimation. And the suitable cleaning time for the fabrication process is given based on the discussion of the possible failure phenomena in semiconductor manufacturing. This article is structured as follows. The prognostic problem in semiconductor manufacturing is defined and its issues are discussed in Section II. Section III details the novel AR-GP method. The feasibility and the promising results of the ARGP method are validated through a numerical example and a practical semiconductor manufacturing process for the failure factor extraction and failure behavior inference, respectively, in Section IV. Finally, Section V draws conclusions.
11-24
### Accumulated Polar Feature-Based Method in Computer Vision The accumulated polar feature (APF)-based method is a robust technique used primarily within the domain of computer vision and image processing to analyze, recognize patterns, and extract features from images. This approach leverages the transformation of Cartesian coordinates into polar coordinates around key points identified within an image. #### Key Concepts Transforming data into polar space allows for more effective representation of circular or radial structures present in visual content. The accumulation process involves aggregating information over specific angular sectors at varying radii from selected keypoints. By doing so, this method can capture both local texture details as well as broader structural characteristics simultaneously[^1]. #### Implementation Steps To implement APF-based methods effectively: - **Keypoint Detection**: Identify distinctive regions across different scales using algorithms like SIFT or FAST. - **Polar Transformation**: Convert neighborhoods surrounding these keypoints into polar coordinate systems where each point has distance \( r \) and angle \( θ \). - **Feature Extraction**: Aggregate intensity values along concentric circles centered on detected keypoints while dividing them into multiple bins based upon angles. Here's how one might code such functionality in Python with OpenCV library support: ```python import cv2 import numpy as np def compute_polar_features(image, kp): # Extract patches around keypoints patch_size = 32 winSize = (patch_size, patch_size) descriptors = [] for p in kp: x, y = int(p.pt[0]), int(p.pt[1]) # Crop region of interest roi = image[y-patch_size//2:y+patch_size//2, x-patch_size//2:x+patch_size//2] # Compute gradient magnitude and orientation mag, ang = cv2.cartToPolar(cv2.Sobel(roi,cv2.CV_64F,1,0,ksize=5), cv2.Sobel(roi,cv2.CV_64F,0,1,ksize=5)) # Create histogram per sector hist = np.zeros((8,)) bin_edges = np.linspace(-np.pi,np.pi,9) for i in range(len(mag)): idx = np.digitize(ang[i],bin_edges,right=True)-1 if(idx>=0): hist[idx%8]+=mag[i] descriptors.append(hist.flatten()) return np.array(descriptors).astype(np.float32) img = cv2.imread('example.jpg',cv2.IMREAD_GRAYSCALE) detector = cv2.FastFeatureDetector_create() keypoints = detector.detect(img,None) descriptors = compute_polar_features(img,keypoints[:10]) # Limit number of keypoints processed here print(f"Descriptors shape: {descriptors.shape}") ``` This script demonstrates extracting simple histograms representing distribution of gradients' orientations inside patches defined by Fast corners found earlier in grayscale input imagery.
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