SELECT
*
FROM
(
SELECT
TMP.*,
ROWNUM ROW_ID
FROM
(
SELECT
STEP_ID AS ,
CREATED_BY AS ,
UNIT_ID AS ,
LAST_UPDATED_BY AS ,
CREATED_TIME AS ,
MOTHER_LOT_ID AS ,
COT_RECIPE AS ,
LAST_UPDATED_TIME AS ,
LAYER_ID AS ,
EQP_GROUP AS ,
PRODUCT_ID AS ,
CREATED_BY_NAME AS ,
EQP_ID AS ,
WAFER_ID AS ,
LAST_UPDATED_BY_NAME AS ,
DATA_STATUS AS ,
SLOT_NO AS ,
DESCRIPTION AS ,
LOT_TYPE AS ,
LOT_ID AS ,
IS_DATA_VALID AS ,
TRACK_RECIPE AS ,
ID AS ,
TECHNOLOGY AS
FROM
T_APC_PR_WAFER_PROCESS_DATA
ORDER BY
LAST_UPDATED_TIME DESC,
ID DESC ) TMP
WHERE
ROWNUM <=:p1)
WHERE
ROW_ID > :p2 "SELECT * FROM ( SELECT TMP.*, ROWNUM ROW_ID FROM ( SELECT WAFER_DATA.ITEM_VALUE AS "WAFER_DATA#ITEM_VALUE",WAFER_INFO.MOTHER_LOT_ID AS "WAFER_INFO#MOTHER_LOT_ID",WAFER_INFO.RECIPE_ID AS "WAFER_INFO#RECIPE_ID",WAFER_INFO.MEASURE_TYPE AS "WAFER_INFO#MEASURE_TYPE",WAFER_DATA.ITEM_TYPE AS "WAFER_DATA#ITEM_TYPE",WAFER_INFO.DATA_STATUS AS "WAFER_INFO#DATA_STATUS",WAFER_DATA.POS_Y AS "WAFER_DATA#POS_Y",WAFER_INFO.STEP_ID AS "WAFER_INFO#STEP_ID",WAFER_DATA.POS_X AS "WAFER_DATA#POS_X",WAFER_INFO.ID AS "WAFER_INFO#ID",WAFER_INFO.DESCRIPTION AS "WAFER_INFO#DESCRIPTION",WAFER_INFO.LOT_TYPE AS "WAFER_INFO#LOT_TYPE",WAFER_DATA.DESCRIPTION AS "WAFER_DATA#DESCRIPTION",WAFER_INFO.LAST_UPDATED_TIME AS "WAFER_INFO#LAST_UPDATED_TIME",WAFER_DATA.FOREIGN_ID AS "WAFER_DATA#FOREIGN_ID",WAFER_DATA.ITEM_NAME AS "WAFER_DATA#ITEM_NAME",WAFER_INFO.PRODUCT_ID AS "WAFER_INFO#PRODUCT_ID",WAFER_DATA.LAST_UPDATED_BY AS "WAFER_DATA#LAST_UPDATED_BY",WAFER_DATA.CREATED_BY AS "WAFER_DATA#CREATED_BY",WAFER_INFO.CREATED_BY_NAME AS "WAFER_INFO#CREATED_BY_NAME",WAFER_DATA.LAST_UPDATED_BY_NAME AS "WAFER_DATA#LAST_UPDATED_BY_NAME",WAFER_DATA.LAST_UPDATED_TIME AS "WAFER_DATA#LAST_UPDATED_TIME",WAFER_INFO.WAFER_ID AS "WAFER_INFO#WAFER_ID",WAFER_DATA.CREATED_TIME AS "WAFER_DATA#CREATED_TIME",WAFER_INFO.LOT_ID AS "WAFER_INFO#LOT_ID",WAFER_INFO.SLOT_NO AS "WAFER_INFO#SLOT_NO",WAFER_INFO.CREATED_BY AS "WAFER_INFO#CREATED_BY",WAFER_INFO.LAST_UPDATED_BY_NAME AS "WAFER_INFO#LAST_UPDATED_BY_NAME",WAFER_INFO.MEASURE_TIME AS "WAFER_INFO#MEASURE_TIME",WAFER_INFO.CREATED_TIME AS "WAFER_INFO#CREATED_TIME",WAFER_INFO.EQP_ID AS "WAFER_INFO#EQP_ID",WAFER_DATA.CREATED_BY_NAME AS "WAFER_DATA#CREATED_BY_NAME",WAFER_INFO.LAST_UPDATED_BY AS "WAFER_INFO#LAST_UPDATED_BY",WAFER_DATA.ID AS "WAFER_DATA#ID",WAFER_DATA.DATA_STATUS AS "WAFER_DATA#DATA_STATUS",WAFER_INFO.PROC_EQP_ID AS "WAFER_INFO#PROC_EQP_ID",WAFER_INFO.PRODUCT_GROUP AS "WAFER_INFO#PRODUCT_GROUP" FROM T_APC_CMP_WAFER_INFO AS WAFER_INFO LEFT JOIN T_APC_CMP_WAFER_DATA AS WAFER_DATA ON WAFER_DATA.FOREIGN_ID = WAFER_INFO.ID ORDER BY WAFER_INFO.LAST_UPDATED_TIME DESC, WAFER_INFO.ID DESC ) TMP WHERE ROWNUM <=:p1) WHERE ROW_ID > :p2"
这里有两个LongSQL语句,帮我分析一下两个SQL是否是同一个原因导致时间长的
最新发布