die-to-die和within-die

本文详细介绍了工艺制造中的基本概念,包括lot、wafer、die,并阐述了die-to-die与within-die工艺参数变动的区别。通过分析不同情况下的芯片对芯片(D2D)和同一芯片内部(WID)的参数差异,为集成电路生产提供了深入理解。

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先介绍几个基本概念:

lot:工艺制造中按某种方式制成的硅柱

wafer:中文名晶圆,lot切成的薄片,是集成电路的载体,晶圆越大,在同一圆片上生产的IC越多


die:wafer根据需要划分不同的区域,每个区域用于生产特定功能的芯片,称之为die

言归正传:

我理解的die-to-die是芯片对芯片,这可以是不同lot上的芯片,也可以是不同wafer上的芯片,也可以是同一wafer上不同die的芯片,而within-die则是一个die。在研究IC的process variation(工艺参数变动)时,往往会将之划分为die-to-die(D2D)variations和within-die(WID)variations。在D2D variations中,同一die上的所有device拥有相同的parameters(参数),而在WID variations中,同一die上的device却表现不同。

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